Fig. 3From: Nanoimprint lithography for nanodevice fabrication I SEM image of the first transistor fabricated by nanoimprint lithography [2]. II SEM images of the process flow to generate high fidelity nanoimprint molds for bit patterned media showing a the original quartz template fabricated from a sparser nanoimprint mold through a densifying DSA process showing many missing dots, b the resist pattern after imprint with the defective stamp, c the block copolymer pattern formed on top of the defective template and d the new quartz template fabricated using the BCP pattern shown in c. Insets are fast Fourier transforms of the images [5] Back to article page