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Nano Convergence
Fig. 5 | Nano Convergence

Fig. 5

From: Phase patterning of metallic glasses through superfast quenching of ion irradiation-induced thermal spikes

Fig. 5

a SEM image of an annealed + irradiated MG, after indentation. Specimen is first annealed at 600 °C to induce nanocrystallization, and then covered by a TEM grid for patterned irradiation by 1 × 1014/cm2, 3.5 MeV Cu ion irradiation at room temperature. Indentation is performed on the crystallized region, which is the region protected by the TEM grid from ion irradiation. Indentation induces crack propagation from the sharp corner of the indenter to the boundary of the crystalline and amorphous phases. b SEM image showing Pt deposition location (circled markers) during the FIB process for site selective TEM lamella preparation. c SEM image of the TEM lamella lift-out from the crystalline-amorphous interface, where the crack is arrested. d Cross sectional TEM micrograph of the interface region, showing that the crack is arrested by the amorphous zone (marked by the white dashed line)

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