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Figure 5 | Nano Convergence

Figure 5

From: Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers

Figure 5

A partially (flood) exposing a multilevel PMMA resist contour within the TASTE process enhances the available pattern variety of 3D structures. The generation of sloped and stepped contours in very close vicinity to each other is enabled by locally exposing a stepped PMMA contours (a-b) with high dosage (i.e. 500 μC cm-2) and thus reducing the Tg below 92°C. Applying a reflow temperature of 110°C, exposed steps are then selectively transformed into a continuous slope while other topographies are unaltered (c-d). Partial flood exposure also optimizes the overall slope accuracy since the thermal properties of the exposed areas are homogenized (scale bars: 1 μm).

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