Figure 2From: Resist-free antireflective nanostructured film fabricated by thermal-NIL FE-SEM images of nanoimprinted AR nanostructures with various process temperatures: (a) 140°C, (b) 150°C, (c) 160°C, and (d) the tilted view of the imprinted AR nanostructures at temperature of 160°C. Back to article page