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Table 1 The diameter ( d , nm), the number of atoms in the unit cell ( N ) and the lattice parameter along the wire axis ( a , Å) for SiNWs and GeNWs with different morphologies after structural optimization

From: Revising morphology of 〈111〉-oriented silicon and germanium nanowires

 

Si{011}

Si{112}

Si{112}-t

d

1.5

2.1

2.5

3.0

3.4

1.9

2.7

3.1

3.1

N

110

170

242

326

422

146

266

362

338

a

5.524

5.483

5.473

5.470

5.469

5.432

5.486

5.470

5.480

 

Ge{011}

Ge{112}

Ge{112}-t

d

1.6

2.2

2.6

3.1

3.5

2.0

2.8

3.2

3.2

N

110

170

242

326

422

146

266

362

338

a

5.429

5.513

5.562

5.588

5.607

5.292

5.552

5.581

5.579

  1. For the simplicity reason Si{011} and Ge{011} denote morphology of SiNWs and GeNWs shown in Figure 1, whereas Si{112}, Ge{112} correspond to the cases in Figure 2 and Si{112}-t, Ge{112}-t indicate morphology presented in Figure 3. The lattice parameters of bulk silicon and germanium are a Si = 5.467 Å and a Ge = 5.646 Å. a is rescaled (divided by \(\sqrt {\mathbf {3}}\)) in order to correspond to the unit of the corresponding bulk lattice parameters.