Fig. 2From: Thermal stability of 2DEG at amorphous LaAlO3/crystalline SrTiO3 heterointerfaces I–V characteristics of LAO/STO heterostructures grown at a different deposition temperatures (T dep) and b different oxygen partial pressures (\(P_{{{\text{O}}_{2} }}\)). The thickness of the LAO overlayers was kept to be 5 nm. For comparison, an I–V characteristic of bare STO substrate is presentedBack to article page