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Table 1 Device parameters used for simulation

From: Demonstration of hetero-gate-dielectric tunneling field-effect transistors (HG TFETs)

 

HG TFET

High-k-only TFET

SiO2-only TFET

L G (nm)

50

50

50

t SOI (nm)

30

30

30

t ins (nm)

2

2

2

Source/drain doping conc. (cm−3)

1020

1020

1020

Channel doping conc. (cm−3)

1015

1015

1015

L high-k (nm)

5

50

X

k value of high-k dielectric

25

25

X