Fig. 10
From: Nanostructured plasmonic substrates for use as SERS sensors
a, b Reproduced with permission from Ref. [66], © 2012, John Wiley and Sons. c Reproduced with permission from Ref. [67], © 2014, American Chemical Society
Nanolithography-free random array generation. a Procedure used to fabricate metal nanopillar arrays using a maskless reactive ion etching process. b Concept underlying the metal nanopillar array leaning process during the evaporation of solvent (left panel), SEM images of the nanopillar arrays (center panel), and comparison of the Raman maps of benzenethiol between the droplet contact region and the original samples (right panel). c Procedure used to fabricate gold nanocoral (GNC) structures having under 10Â nm metal nanogaps, using the hydrothermal treatment of an aluminum film and SEM images of the top and side views of boehmite and gold nanocoral substrates.