Table 1 Dimensions of the silicon stamp for the NIL experiment
From: A modified squeeze equation for predicting the filling ratio of nanoimprint lithography
Parameters | Case 1 | Case 2 | Case 3 |
|---|---|---|---|
Value (nm) | Value (nm) | Value (nm) | |
W (width) | 600 | 1200 | 1800 |
S (indenter) | 2200 | 2200 | 3400 |
C (depth) | 250 | 250 | 250 |
Hi (height) | 200, 300, 400 | 200, 300, 400 | 200, 300, 400 |