Fig. 7From: Innovations in biomedical nanoengineering: nanowell array biosensorFE-SEM images of large-area of a nanotrench and b nanowell array and AFM images of c nanotrench and d nanowell arrays after the DODE lithography process; the inset shows high-magnification images of nanopatterns; and line profiles of each e nanotrench and f nanowell patterns measured from AFM images; high aspect ratios greater than 20:1 were obtained [51]Back to article page