Fig. 5
From: Directed self-assembly of a two-state block copolymer system
SEM images of aligned ladder-shaped block copolymer patterns inside rectangular confinement. Aspect ratio was 2:1. Vertical width of the rectangular confinement was a 2.0L0, b 3.1L0, c 4.1L0, d 5.1L0, e 6.1L0, f 7.0L0, and g 7.9L0 for SD45 (L0 = 36 nm). For h, 16 kg/mol PS-b-PDMS with L0 = 18 nm was used. Parallel bars were formed in the horizontal direction (0 state) to minimize the number of T-junctions. Scale bars, 200 nm