Fig. 2
From: Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
a EUV dose-dependent s-SNOM chemical imaging results. The red color indicates higher infrared absorption. The scale bar is 3 μm. b Line profiles taken from the image in (a) as indicated by the black dotted line. A and B respectively indicate EUV-exposed and non-exposed areas. c Comparison of the peak height of the cage-like structure from FTIR spectra and phase differences (\({\varphi }_{A}-{\varphi }_{B}\)) of s-SNOM at 1125 cm−1