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Fig. 5 | Nano Convergence

Fig. 5

From: Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist

Fig. 5

LER analysis images of HP 100, 200, 300, and 500 nm. (Top) s-SNOM results of latent images that were taken with a 1125 cm−1 infrared laser. (Middle) AFM topographic and (bottom) scanning electron microscopy (SEM) results of the developed pattern. Due to the 3-dimensional (3D) shape of the probe tip, the AFM could not visualize the HP 100 nm pattern. The LER values of the HP 200 and 300 nm patterns for SEM are overestimated due to the weak image contrast. The scale bar is 500 nm for all cases

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