Table 1 Linewidth and LER values from s-SNOM, AFM, and SEM. HP 100Â nm image from AFM was excluded from the evaluation because it was not fully scanned
From: Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
Unit: mm | Pattern | Linewidth | LER |
|---|---|---|---|
s-SNOM | HP-100 | 105.3 | 19.87 |
HP-200 | 208.1 | 18.92 | |
HP-300 | 309.9 | 18.23 | |
HP-500 | 519.0 | 17.18 | |
AFM | HP 100 | – | – |
HP 200 | 315.3 | 8.770 | |
HP 300 | 437.0 | 10.82 | |
HP 500 | 639.6 | 15.14 | |
SEM | HP 100 | 123.5 | 9.050 |
HP 200 | 243.6 | 12.31 | |
HP 300 | 352.1 | 16.00 | |
HP 500 | 529.8 | 8.960 |