Fig. 12From: Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxideComprehensive schematic of the ferroelectric and RS HfO2 memory device and the effect of Vo for their performances. a Ferroelectric switching mechanism based on the movement of oxygen atoms (up) and Vo-mediated RS mechanism (down). b Effects of Vo and their roles in ferroelectric and resistive memory performance. c Key parameters affecting the concentration and motion of Vo in the filmBack to article page