Fig. 9From: Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxideLow forming voltage exhibited on low-energy GBs in HfO2-based RS devices. a Forming process in annealed polycrystalline HfO2 at specific locations. b Typical bipolar RS behavior observed at the low voltage forming site (GB location). c Current map measurement in a write–read–erase–read cycle, which allows the locations to recover their insulating properties. a, b, c reproduced with permission from [184]. d, e reproduced with permission from [187]Back to article page