Fig. 3From: Formation techniques for upper active channel in monolithic 3D integration: an overviewAverage grain size is controlled by light energy density from 1.56 to 1.82 J/cm2 [26]. When subjected to thermal energy below 1.8 J/cm2, the a-Si thin film undergoes incomplete melting, resulting in the formation of small-grained poly-Si a as opposed to the development of larger grains b observed at higher thermal energy levelsBack to article page