Fig. 5From: Formation techniques for upper active channel in monolithic 3D integration: an overviewa Seed window process for laser-induced SCS [42] b Comparison of the electrical performance of various crystallization techniques as laser-induced epitaxial growth (LIEG), LPCVD selective epitaxial growth (LPCVD SEG) at 800 oC, and furnace-annealed sold phase epitaxy (SPE) at 580 oC [42]Back to article page