Skip to main content

Table 3 Comparison of proton-based ECRAM for in-memory computing

From: Electrochemical random-access memory: recent advances in materials, devices, and systems towards neuromorphic computing

Mobile ions

Channel

Electrolyte

Reservoir

Effective size

Min

Write time (operation V)

Retention @RT

Max

Conductance Range

On/off ratio

Linearity

Multilevel

Endur

Refs

H

PEDOT:PSS/PEI

Nafion

PEDOT:PSS

10–3 mm2

6 ms

(± 1 V)

10 ms

600 μS–2mS

3.34

4.5/-3.6

500

–

[71]

H

α-MoO3

EMIM-TFSI

–

L:—mm

W:—mm

1 ms

(+ 2.5 V / -1.8 V)

–

70–95 nS

1.4

–

50

–

[75]

H

PEDOT:PSS

Nafion

PEDOT:PSS

L: 45 μm

W: 125 μm

50 μs

(-0.95 V/ + 1.2 V)

–

50 –100 nS

2

3.1/-0.4

50

108

[72]

H

p(g2T-TT)

EMIM:TFSI PVDF-HFP

p(g2T-TT)

L: 45 μm

W: 15 μm

20 ns

(± 1 V)

 > 5 min

2–120 μS

60

1.2/03

100

2.1 × 109

[74]

H

PEDOT:PSS

SiO2 + ionic liquid

PEDOT:PSS

L: 1 μm

W: 1 μm

100 ns

(± 1 V)

–

1–4 mS

4

4.8/-1.7

100

109

[82]

H

NdNiO3

Silica

–

L: 200 μm

W: 200 μm

5 s

(+ 0.7 V/-1.0 V)

–

300–400 μS

1.3

–

40

224

[83]

H

WO3

Nafion

Pd

L: 100 μm

W: 500 μm

5 ms

(± 200 nA)

Stable in air

0–350 μS

107

0.5/0.1

1000

2 × 104

[78]

H

WO3

hBN

Si

L: 5–100 μm

W: 10 μm

10 ms

(± 1 V)

1000 s

8–11 μS

1.4

0.9/0.9

64

105

[84]

H

(Mxene/TAPA)n

H2SO4-PVA

–

L: 1000 μm

W: 20 μm

200 ns

(± 1 V)

50 s

0.2–0.85 mS

4.25

0.65/-1.59

100

108

[79]

H

WO3

PSG

Pd

L: 150 nm

W: 50 nm

5 ns

(+ 10 V/-8.5 V)

100 s

11–230 nS

20.5

0.7/0.1

1000

105

[81]