Thematic series on Nanopatterning Lithography
Guest Editor: Jae Jong Lee, Helmut Schift
To fabricate nanoscale structures on different kinds of substrates, nanopatterning lithography technologies have been studied during the past decades. Especially, nanoimprint lithography (NIL) is a promising technology for producing two-dimensional or three dimensional structures with sub-10 nm half-pitch features. The advantages of this simple process include low cost, high replication fidelity, and relatively high throughput and productivity. Recently, nanoscale and micro-scale hybrid structures have attracted significant research interest due to their potential for use in biosensors, anti-reflection films, anti-fingerprint films, solar cells, nanofluidic and microfluidic channels, and some functional optical films. The nanopatterning lithography systems using roll-typed stamps have become increasingly appealing technologies for undertaking mass production and continuous fabrication of those hybrid patterns on large area substrates. Papers in this thematic series will introduce and review the recent advances in the field of the nanopatterning lithography, from the fabrication processes and techniques to manufactured functional devices and their novel applications.
All papers and supplementary information (if any) should be submitted online and prepared according to the NCON guidelines. Authors should indicate that the paper is submitted for the special issue in their cover letter and is not published or being considered to publish elsewhere. All submissions will be subject to peer review before possible acceptance for publication in NCON which is free of charge and highly accessed by readers from all over the world.
Deadline for submissions: 30/06/2017
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