Call for Papers: Thematic Series on Nanopatterning Lithography and Applications
Nano Convergence welcomes submissions to the thematic series on 'Nanopatterning Lithography and Applications'.
Recently, nanopatterning with Lithography has attracted significant research interest due to their potential for use in biosensors, anti-reflection films, anti-fingerprint films, solar cells, nanofluidic and microfluidic channels, and some functional optical films. The advantages of this simple process include low cost, high replication fidelity, and relatively high throughput and productivity. Papers in this thematic series will introduce and review the recent advances in the field of the nanopatterning with lithography, from the fabrication processes and techniques to manufactured functional devices and their novel applications.
Submission deadline: May 31st 2018
Lead Guest Editor:
JaeJong Lee, Korea Institute of Machinery and Materials, South Korea
Helmut Schift, Paul Scherrer Institute, Switzerland
Sunggook Park, Louisiana State University, USA
Annual Journal Metrics
34 days to first decision for reviewed manuscripts only
28 days to first decision for all manuscripts
52 days from submission to acceptance
16 days from acceptance to publication
87 Altmetric mentions
- ISSN: 2196-5404 (electronic)