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Call for Papers: Thematic Series on Nanopatterning Lithography and Applications

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Nano Convergence welcomes submissions to the thematic series on 'Nanopatterning Lithography and Applications'. 

Recently, nanopatterning with Lithography has attracted significant research interest due to their potential for use in biosensors, anti-reflection films, anti-fingerprint films, solar cells, nanofluidic and microfluidic channels, and some functional optical films. The advantages of this simple process include low cost, high replication fidelity, and relatively high throughput and productivity. Papers in this thematic series will introduce and review the recent advances in the field of the nanopatterning with lithography, from the fabrication processes and techniques to manufactured functional devices and their novel applications.

Submission deadline: May 31st 2018

Lead Guest Editor:
JaeJong Lee, Korea Institute of Machinery and Materials, South Korea

Guest Editor: 
Helmut Schift, Paul Scherrer Institute, Switzerland 
Sunggook Park, Louisiana State University, USA

Annual Journal Metrics

  • Speed
    34 days to first decision for reviewed manuscripts only
    28 days to first decision for all manuscripts
    52 days from submission to acceptance
    16 days from acceptance to publication

    87 Altmetric mentions